Selective emitter photovoltaic device

ABSTRACT

A method for fabricating a photovoltaic device includes forming a patterned layer on a doped emitter portion of the photovoltaic device, the patterned layer including openings that expose areas of the doped emitter portion and growing an epitaxial layer over the patterned layer such that a crystalline phase grows in contact with the doped emitter portion and a non-crystalline phase grows in contact with the patterned layer. The non-crystalline phase is removed from the patterned layer. Conductive contacts are formed on the epitaxial layer in the openings to form a contact area for the photovoltaic device.

RELATED APPLICATION INFORMATION

This application is a Continuation application of co-pending U.S. patentapplication Ser. No. 13/706,820 filed on Dec. 6, 2012, incorporatedherein by reference in its entirety. This application is related tocommonly assigned co-pending U.S. patent application Ser. No. 13/032,866filed on Feb. 23, 2011, and incorporated herein by reference in itsentirety.

BACKGROUND

1. Technical Field

The present invention relates to photovoltaic devices, and moreparticularly to selective emitter photovoltaic device structures whichinclude epitaxial grown layers to repel minority carriers from contactareas.

2. Description of the Related Art

Selective emitter structures improve conversion efficiency of solarcells as compared with single emitter structures. The selective emitterstructures repel minority carriers from metal contact regions at theemitter by employing locally high doping levels at the contact regions.However the formation of the locally high doping regions requires longdrive-in steps to drive-in dopants at high temperatures.

A single-emitter structure employs a single n⁺ diffusion to form anemitter and is currently an industry mainstream structure.Single-emitter devices can currently achieve a conversion efficiencyrange of between about 18-19% in production.

A double-emitter structure employs an n⁺⁺ diffusion to passivatecontacts. This is believed to be necessary to improve efficiency, whichin some cases reaches over 20%. However, the double-emitter structuresuffers from the time and expense of long drive-in steps to form the n⁺⁺regions at high temperatures. The long drive-in steps to form n⁺⁺regions at the high temperatures may degrade the lifetime of solar gradewafers by activating impurities or forming boron-oxygen complexes.

SUMMARY

A method for fabricating a photovoltaic device includes forming apatterned layer on a doped emitter portion of the photovoltaic device,the patterned layer including openings that expose areas of the dopedemitter portion and growing an epitaxial layer over the patterned layersuch that a crystalline phase grows in contact with the doped emitterportion and a non-crystalline phase grows in contact with the patternedlayer. The non-crystalline phase is removed from the patterned layer.Conductive contacts are formed on the epitaxial layer in the openings toform a contact area for the photovoltaic device.

Another method for fabricating a photovoltaic device includes forming afirst emitter on a monocrystalline substrate; forming a patterned layeron the first emitter, the patterned layer including openings that exposeareas of the first emitter; growing an epitaxial layer over thepatterned layer such that a crystalline phase grows in contact with thefirst emitter and a non-crystalline phase grows in contact with thepatterned layer; removing the non-crystalline phase from the patternedlayer such that the crystalline form in contact with the first emitterforms a second emitter; and forming metal fingers on the epitaxial layerin the openings to form a contact area of the photovoltaic device.

Yet another method for fabricating a photovoltaic device includesforming a first emitter on a monocrystalline substrate; forming apatterned layer on the first emitter, the patterned layer includingopenings that expose areas of the first emitter, the patterned layerincluding one or more of a passivation layer and an anti-reflectioncoating; doping portions of the first emitter to form highly dopeddiffusion regions having a dopant concentration greater than otherportions of the first emitter, the highly doped diffusion regionscorresponding with locations of the openings in the patterned layer;growing an epitaxial layer over the patterned layer such that acrystalline phase grows in contact with the first emitter and anon-crystalline phase grows in contact with the patterned layer;removing the non-crystalline phase from the patterned layer such thatthe crystalline form in contact with the first emitter forms a secondemitter; and forming metal fingers on the epitaxial layer in theopenings to form a contact area of the photovoltaic device.

A photovoltaic device includes a contact area including: a doped emitterlayer; and a patterned layer formed on the doped emitter layer. Thepatterned layer includes openings that expose areas of the doped emitterlayer. An epitaxial layer has a crystalline phase grown in contact withthe doped emitter portion. Conductive contacts are formed on theepitaxial layer in the openings.

Another photovoltaic device includes a first emitter formed on amonocrystalline substrate, and a patterned layer formed on the firstemitter. The patterned layer includes openings that expose areas of thefirst emitter. An epitaxial layer is formed in the openings of thepatterned layer such that a crystalline phase grows in contact with thefirst emitter and forms a second emitter. Metal fingers are formed onthe epitaxial layer in the openings to form a contact area.

Yet another photovoltaic device includes a first emitter formed on amonocrystalline substrate, and a patterned layer formed on the firstemitter. The patterned layer includes openings that expose areas of thefirst emitter. The patterned layer further includes one or more of apassivation layer and an anti-reflection coating. Highly doped diffusionregions are formed in the first emitter and have a dopant concentrationgreater than other portions of the first emitter. The highly dopeddiffusion regions correspond with locations of the openings in thepatterned layer. An epitaxial layer is formed in the openings of thepatterned layer such that a crystalline phase is in contact with thefirst emitter and forms a second emitter. Metal fingers are formed onthe epitaxial layer in the openings to form a contact area.

These and other features and advantages will become apparent from thefollowing detailed description of illustrative embodiments thereof,which is to be read in connection with the accompanying drawings.

BRIEF DESCRIPTION OF DRAWINGS

The disclosure will provide details in the following description ofpreferred embodiments with reference to the following figures wherein:

FIG. 1 is a cross-sectional view of a photovoltaic device having anepitaxial layer formed between an emitter layer and conductive contacts(e.g., metal fingers) in accordance with the present principles;

FIG. 2 is a cross-sectional view of a photovoltaic device having highlydoped diffusion regions formed in an emitter layer in accordance withthe present principles;

FIG. 3 is a cross-sectional view of a photovoltaic device having asurface passivation layer formed between an epitaxial layer and metalfingers in accordance with the present principles;

FIG. 4 is a cross-sectional view of a photovoltaic device having apatterned layer configured with openings on an emitter layer inaccordance with the present principles;

FIG. 5 is a cross-sectional view of the photovoltaic device of FIG. 4having an epitaxial layer formed on the patterned layer and in theopenings in accordance with the present principles;

FIG. 6 is a cross-sectional view of the photovoltaic device of FIG. 5having non-crystalline portions of the epitaxial layer removed from thepatterned layer in accordance with the present principles;

FIG. 7 is a cross-sectional view of the photovoltaic device of FIG. 6showing metal fingers formed in accordance with the present principles;

FIG. 8 is a diagram, showing open circuit voltage (V_(OC)) in mV versusemitter thickness in nm, and plotting surface recombination velocity(SRV) at 10, 100 and 1000 cm/s for two doping levels (N_(E)=10¹⁹ cm⁻³and N_(E)=10²⁰ cm⁻³) in accordance with the present principles;

FIG. 9 is a graph showing minority carrier lifetime in seconds versusCarrier Density in atoms/cm⁻³ for a passivation simulation in accordancewith the present principles; and

FIG. 10 is a block/flow diagram showing method for fabricating aphotovoltaic device in accordance with illustrative embodiments.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

In accordance with the present principles, selective emitterphotovoltaic device structures are disclosed, which include highly dopedthin epitaxial layers to repel minority carriers from contact areas atfront and back ends of photovoltaic cells. A method of formingphotovoltaic cell structures by selective epitaxial growth of the highlydoped layer(s) using plasma enhanced chemical vapor deposition isprovided. The epitaxial growth is preferably a low temperature processto avoid damage to other areas of the photovoltaic device. Theefficiency of solar devices made in accordance with the presentprinciples is expected to exceed those of single-emitter designs andother double-emitter designs.

It is to be understood that the present invention will be described interms of a given illustrative architecture having substrates andphotovoltaic stacks; however, other architectures, structures,substrates, materials and process features and steps may be variedwithin the scope of the present invention.

It will also be understood that when an element such as a layer, regionor substrate is referred to as being “on” or “over” another element, itcan be directly on the other element or intervening elements may also bepresent. In contrast, when an element is referred to as being “directlyon” or “directly over” another element, there are no interveningelements present. It will also be understood that when an element isreferred to as being “connected” or “coupled” to another element, it canbe directly connected or coupled to the other element or interveningelements may be present. In contrast, when an element is referred to asbeing “directly connected” or “directly coupled” to another element,there are no intervening elements present.

A design for a photovoltaic device may be created for integrated circuitintegration or may be combined with components on a printed circuitboard. The circuit/board may be embodied in a graphical computerprogramming language, and stored in a computer storage medium (such as adisk, tape, physical hard drive, or virtual hard drive such as in astorage access network). If the designer does not fabricate chips or thephotolithographic masks used to fabricate chips or photovoltaic devices,the designer may transmit the resulting design by physical means (e.g.,by providing a copy of the storage medium storing the design) orelectronically (e.g., through the Internet) to such entities, directlyor indirectly. The stored design is then converted into the appropriateformat (e.g., GDSII) for the fabrication of photolithographic masks,which typically include multiple copies of the chip design in questionthat are to be formed on a wafer. The photolithographic masks areutilized to define areas of the wafer (and/or the layers thereon) to beetched or otherwise processed.

Methods as described herein may be used in the fabrication ofphotovoltaic devices and/or integrated circuit chips with photovoltaicdevices. The resulting devices/chips can be distributed by thefabricator in raw wafer form (that is, as a single wafer that hasmultiple unpackaged devices/chips), as a bare die, or in a packagedform. In the latter case the device/chip is mounted in a single chippackage (such as a plastic carrier, with leads that are affixed to amotherboard or other higher level carrier) or in a multichip package(such as a ceramic carrier that has either or both surfaceinterconnections or buried interconnections). In any case, thedevices/chips are then integrated with other chips, discrete circuitelements, and/or other signal processing devices as part of either (a)an intermediate product, such as a motherboard, or (b) an end product.The end product can be any product that includes integrated circuitchips, ranging from toys, energy collectors, solar devices and otherapplications including computer products or devices having a display, akeyboard or other input device, and a central processor. Thephotovoltaic devices described herein are particularly useful for solarcells or panels employed to provide power to electronic devices, homes,buildings, vehicles, etc.

It should also be understood that material compounds will be describedin terms of listed elements, e.g., GaInP, InGaAs or SiGe. Thesecompounds include different proportions of the elements within thecompound, e.g., InGaAs includes In_(x),Ga_(y)As_(1-x-y), where x, y areless than or equal to 1, or SiGe includes Si_(x)Ge_(1-x) where x is lessthan or equal to 1, etc. In addition, other elements may be included inthe compound, such as, e.g., AlInGaAs, and still function in accordancewith the present principles. The compounds with additional elements willbe referred to herein as alloys.

The present embodiments may be part of a photovoltaic device or circuit,and the circuits as described herein may be part of a design for anintegrated circuit chip, a solar cell, a light sensitive device, etc.The photovoltaic device may be a large scale device on the order of feetor meters in length and/or width, or may be a small scale device for usein calculators, solar powered lights, etc. It is also to be understoodthat the present invention may include tandem (multi-junction)structures. The tandem structure may include cells having differentmaterials and layers.

Reference in the specification to “one embodiment” or “an embodiment” ofthe present principles, as well as other variations thereof, means thata particular feature, structure, characteristic, and so forth describedin connection with the embodiment is included in at least one embodimentof the present principles. Thus, the appearances of the phrase “in oneembodiment” or “in an embodiment”, as well any other variations,appearing in various places throughout the specification are notnecessarily all referring to the same embodiment.

It is to be appreciated that the use of any of the following “/”,“and/or”, and “at least one of”, for example, in the cases of “A/B”, “Aand/or B” and “at least one of A and B”, is intended to encompass theselection of the first listed option (A) only, or the selection of thesecond listed option (B) only, or the selection of both options (A andB). As a further example, in the cases of “A, B, and/or C” and “at leastone of A, B, and C”, such phrasing is intended to encompass theselection of the first listed option (A) only, or the selection of thesecond listed option (B) only, or the selection of the third listedoption (C) only, or the selection of the first and the second listedoptions (A and B) only, or the selection of the first and third listedoptions (A and C) only, or the selection of the second and third listedoptions (B and C) only, or the selection of all three options (A and Band C). This may be extended, as readily apparent by one of ordinaryskill in this and related arts, for as many items listed.

Referring now to the drawings in which like numerals represent the sameor similar elements and initially to FIG. 1, a photovoltaic devicestructure 100 is shown in accordance with one illustrative embodiment.It should be understood that the present principles will be describedillustratively in terms of a selective emitter (SE) device structure.This structure should not be construed as limiting as other devicestructures may benefit from the present principles. The structure 100 ofthe selective emitter includes a highly doped layer (e.g., n⁺⁺) 102 thatmay be employed for forming an emitter and/or dopant diffusion regionsthat do not employ a long drive-in step for dopant diffusion. The highlydoped thin layer 102 is preferably grown epitaxially by a selectivelow-temperature epitaxial growth process using plasma-enhanced chemicalvapor deposition (PECVD). Other techniques such as hot-wire CVD (HWCVD),etc. may also be employed.

A substrate 104 may include a monocrystalline material, such as Si, Ge,SiGe, SiC, etc. The substrate 104 is doped and may be p-doped orn-doped. In the example described, the substrate 104 includes a p-typedopant; however, one skilled in the art would recognize that theconductivities of the layers may be reversed from the described example.In one embodiment, the substrate 104 is p-doped and a first diffusedemitter 106 is formed by providing an n-doped portion of the substrate104. The first diffused emitter 106 has a passivation layer and/oranti-reflection coating (ARC) layers 108 formed thereon. The firstemitter 106 is doped (n⁺) and has an activated doping level below 10¹⁹cm⁻³. The first emitter 106 may be shallower than about 1 micron. Thefirst emitter layer 106 may be part of the substrate 104 (andcounterdoped) or may be grown on the substrate 104 by, e.g., anepitaxial growth process. The first emitter 106 may be in-situ dopedwith a dopant type opposite the dopant type of the substrate 104. Asecond emitter 110 is formed from the epitaxial layer 102 on the firstemitter 106. The passivation/ARC layer 108 is opened up to exposeportions of the first emitter 106 and permit the formation of the secondemitter 110. The second emitter 110 is doped (n⁺⁺) and has an activateddoping level between 10¹⁹ and 5×10²⁰ cm⁻³.

Metal fingers 112 are formed in contact with the second emitter 110 inbetween portions of the passivation/ARC layers 108. The metal fingers112 may include, e.g., tungsten, silver, aluminum, etc.). Metal fingers112 permit for low electrical contact resistance.

Referring to FIG. 2, in one embodiment, diffusion regions 116 are formedin the first emitter 106. The diffusion regions 116 may include n⁺⁺regions. By employing epitaxial layers for the second emitter 110, then⁺ epi-layer of the second emitter 110 permits a shallower n⁺⁺ diffusionregion 116. In one example, the diffusion region extends to a positionless than about 0.5 microns (out of about 1 micron). This results in ashorter drive-in process for forming regions 116. The n⁺ epi-layer forthe second emitter 110 is grown after n⁺⁺ diffusion for the diffusionregions 116. In another embodiment, the regions 116 are formed after thedeposition of the epi-layer 102. The regions 116 may be formed usingdopants of the epi-layer 102, which can be diffused into the firstemitter 106 by an anneal process.

Referring to FIG. 3, in another embodiment, a surface passivation layer118 may be employed. The surface passivation layer 118 may include,e.g., n⁺ or i a-Si:H for surface passivation (p⁺ or i a-Si:H for p+first emitters). Other passivation materials may be employed as well.The passivation layer 118 may include nanocrystalline ormicrocrystalline Si:H as well. Other passivation layer 118 materials,such as, e.g., Al₂O₃ may be employed, although some material used topassivate the metal contacts 116 can result in fill-factor loss due tolarge bandgaps. In particularly useful embodiments, amorphous,nanocrystalline or microcrystalline Si:H having a thickness of betweenabout 1 to about 15 nm, and more preferably between about 2 and about 5nm may be employed for surface passivation layer 118. It should beunderstood that the embodiments of FIGS. 1, 2 and 3 may be employedtogether or in any combination.

Referring to FIGS. 4-7, method steps for forming a contact area for aphotovoltaic device configured to repel minority carriers isillustratively shown in accordance with an illustrative embodiment.

Referring to FIG. 4, the substrate 104 is doped to form the firstemitter 106. The first emitter 106 may include a dopant concentration ofless than 10¹⁹ cm⁻³ (n+), a comparable doping concentration may beprovided for a p-type first emitter 106 formed in an n-type dopantsubstrate 104. After the first emitter diffusion, a patternedpassivation/ARC layer or layers 108 are formed on the first emitter 106and patterned to form openings 120. Patterning may include the use ofany known patterning process, such as, e.g., lithography. At this time,the diffusion regions 116 of FIG. 2 may be formed through the openings120.

Referring to FIG. 5, an epitaxial layer 122 (e.g., n⁺) is grownselectively on exposed portions of the first emitter 106 through thepassivation/ARC layer 108 (in areas where the passivation/ARC layer 108has been removed by patterning). The epitaxial layer 122 may be dopedin-situ or by other methods. The epitaxial layer 122 may include a Sicontaining layer or a Ge containing layer grown by plasma enhancedchemical vapor deposition (PECVD) resulting in non-crystalline material123 on top of the passivation/ARC layer 108, and crystalline layers 125(second emitter 110) on top of the substrate surface (openings inpassivation/ARC layer 108). The non-crystalline layers 123 may beremoved selectively, e.g., by an in-situ dry etch technique, e.g., usinghydrogen plasma or other etching materials.

In particularly useful embodiments, the epitaxial layer 122 includeshydrogen content in the range of about 5-40% (atomic percent), and mayinclude germanium (Ge), carbon (C), fluorine (F), deuterium (D),nitrogen (N) and combinations thereof. Non-crystalline refers toamorphous, nanocrystalline or microcrystalline, while crystalline refersto single crystalline or poly crystalline. The gas source providing Sifor the epitaxial layer 122 may include silane (SiH₄), other gases suchas disilane (Si₂H₆), dichlorosilane (DCS), tetrafluorosilane (SiF₄) orcombinations thereof may be used as well. The gas source providing Gefor Ge containing layers may include germane (GeH₄). In-situ p-typedoping may be performed using diborane (B₂H₆) or trimethylboron (TMB)sources, and in-situ n-type doping may be performed using a phosphine(PH₃) gas source, although other dopant sources may be used as well.

In one embodiment, the selective epitaxial growth of silicon isperformed in a hydrogen diluted silane environment using a plasmaenhanced chemical vapor deposition process (PECVD). The gas ratio ofhydrogen gas to silane gas ([H₂]/[SiH₄]) at 150 degrees C. is preferablybetween 0 to about 1000. In particularly useful embodiments, epitaxialgrowth of silicon begins at a gas ratio of about 5-10. The epitaxial Siquality is improved by increasing the hydrogen dilution, e.g., to 5 orgreater.

Epitaxial silicon can be grown using various gas sources, e.g., silane(SiH₄), dichlorosilane (DCS), SiF₄, SiCl₄ or the like. The quality ofepitaxial silicon improves by increasing the dilution of hydrogen usingthese or other gases. For higher hydrogen dilution, smoother interfaceswere produced (epitaxial silicon to crystalline silicon) and fewerstacking faults and other defects were observed.

Radio-frequency (RF) or direct current (DC) plasma enhanced chemicalvapor deposition (CVD) is preferably performed at deposition temperatureranges from about room temperature to about 400 degrees C., andpreferably from about 150 degrees C. to about 250 degrees C. Plasmapower density may range from about 2 mW/cm² to about 2000 mW/cm². Adeposition pressure range may be from about 10 mTorr to about 5 Torr.

A carrier gas such as hydrogen (H₂), deuterium (D₂), helium (He) orargon (Ar) may be used for any or all of the layers. The carrier gas maybe pre-mixed with the gas sources or flowed simultaneously with the gassource at the time of growth. The gas flow ratio is preferably[H₂]/[SiH₄]>5. For p⁺⁺ growth (n-type substrate), Ge may be included inthe layer 122. In this case, the gas flow ratio is preferably[H₂]/([SiH₄]+[GeH₄])>5. The growth temperature for the epitaxial layer122 may be less than about 400 degrees C. and more preferably between150 and 250 degrees C., although higher or lower temperatures may beemployed as well. Low-temperature epitaxial growth PECVD to passivatecontacts preferably include in-situ doping of n⁺⁺ layer 122 (with anactivated doping range of between about 10¹⁸ and about 3×10²⁰ cm⁻³. Theepitaxial layer 122 may include a thickness of between about 2 nm andabout 100 nm, and preferably between 5 nm-25 nm.

In one embodiment, an etching process of amorphous silicon may beemployed to concurrently form epitaxial silicon on exposed crystallinesilicon areas. It should be understood that the epitaxial growth andetching may be performed sequentially or concurrently as needed. Siliconis deposited at, e.g., 500 mTorr, [H₂]/[SiH₄]=14 and power density of 4mW/cm². As a result, the silicon is epitaxial within the open areas 120where the silicon is exposed to e.g., c-Si of the substrate 104. Thesilicon on the layer 108 forms as non-epitaxial (e.g., amorphous)silicon. A H₂ plasma etch may be performed at, e.g., 150 degrees C. at900 mTorr, resulting in an etch selectivity of approximately 1:3 forc-Si (crystalline layer 125) with respect to a-Si:H (non-crystallinelayer 123). It should be understood that a non-epitaxial portion(amorphous Si) grown on insulator materials can be etched using gasessuch as, e.g., H₂, HCl, Cl₂, Ar, etc. The epitaxial deposition and theH₂ plasma etch may be performed sequentially or concurrently in a samechamber. The selective epitaxial growth can be achieved either byalternating gas pulses responsible for the epitaxial growth (e.g.,silane and dopant species) and the etch (plasma etchants, e.g., H₂, HCl,etc.) or by simultaneous flow of all the gases. In one embodiment, thediffusion regions 116 may be formed at a later time by driving dopantsfrom the crystalline portions 125 into the emitter 106.

Referring to FIG. 6, whether or not the selective etching/depositionprocess is employed, the non-crystalline layers 123 are removedselectively, e.g., by an in-situ dry etch technique. The dry etch mayinclude, e.g., a hydrogen plasma etch, as described; however, ex-situremoval of the non-crystalline layer 123 may include employing a wetetch with a wet chemistry, such as, dilute HF (hydrofluoric acid). Otherplasma gases and wet etchants may also be employed.

Referring to FIG. 7, surface passivation layers 118 (FIG. 3) may beformed at this time. A layer of metal is formed over the passivation/ARClayer 108 and over the crystalline layers 125 that form the secondemitter 110. The metal layer is patterned to form the metal fingers 112for an emitter contact. The metal layer may be deposited byelectroplating, screen printing or other deposition processes.

As described above, a selective growth process provides crystallinegrowth on the substrate 104 (first emitter 106), and non-crystallinegrowth on the passivation/ARC layer 108. The non-crystalline portion 125may be removed selectively, e.g., by H plasma. In another embodiment, anon-selective deposition process may include forming and patterning themetal fingers 112. The metal fingers may then be employed as a hard maskto remove the non-crystalline portion 125 on top of the passivation/ARClayer 108.

Referring to FIG. 8, a diagram, showing simulated open circuit voltage(V_(OC)) in mV versus emitter thickness in nm, for three surfacerecombination velocity (SRV) levels of 10, 100 and 1000 cm/s and twodoping levels (N_(E)=10¹⁹ Cm⁻³ and N_(E)=10²⁰ cm⁻³). A device structure200 used for simulation includes a 2 micron thick p-type monocrystallineSi substrate 202. The substrate 202 has an n+ emitter 204 which could beformed thereon by an epitaxial process in accordance with the presentprinciples. A constant SRV of 50 cm/s was considered for the back sideof the substrate 202 while SRV was varied for the front side in thesimulation. The simulation shows that high doping in n⁺ epi emitter 204(including crystalline Si:H) reduces sensitivity to surfacerecombination velocity (SRV). This is because the number of minoritycarriers (holes in this case) reaching the surface is reduced due to thehigh electric field. As a result, a thin layer of amorphous,nanocrystalline (nc), and/or microcrystalline (μc) Si:H is sufficient topassivate the surface.

Referring to FIG. 9, a graph of minority carrier lifetime in secondsversus Carrier Density in atoms/cm⁻³ is shown for a passivationexperiment. Approximately 3 nm of n⁺ a-Si:H was grown on both sides ofp-type (Float Zone) FZ Si wafer (with a bulk lifetime, t_(bulk)≈1.3 ms).The 3 nm represented a passivation layer on an n+ emitter. Equation (1)provides: 1/t_(eff)=1/t_(bulk)+2S/W, where W (wafer thickness)=300 μm,and S is the surface recombination velocity (SRV) S≈100 cm/s. For theabove, t_(eff)≈150 μs at 10¹⁵ cm⁻³ and therefore the 3 nm passivationlayer thickness is well suited for passivating of n⁺ epitaxially grownlayer (emitter).

Referring to FIG. 10, methods for fabricating a photovoltaic device areillustratively depicted in accordance with the present principles. Theflowchart and/or block diagram of the FIG. 10 illustrates thearchitecture, functionality, and operation of possible implementationsaccording to various embodiments of the present invention. It shouldalso be noted that, in some alternative implementations, the functionsnoted in the blocks may occur out of the order noted in FIG. 10. Forexample, two blocks shown in succession may, in fact, be executedsubstantially concurrently, or the blocks may sometimes be executed inthe reverse order, depending upon the functionality involved. It willalso be noted that each block of the block diagrams and/or flowchartillustration, and combinations of blocks in the block diagrams and/orflowchart illustration, can be implemented by special purposehardware-based systems that perform the specified functions or acts, orcombinations of special purpose hardware and computer instructions.

In block 304, an emitter layer (first emitter) is formed on a substrate,preferably a monocrystalline semiconductor substrate; however, amulti-crystalline substrate may be used as well. The emitter layer maybe formed by doping the substrate using a diffusion process (diffusionlayer and anneal/drive-in), ion/dopant implantation or other dopingprocess. In another embodiment, an emitter layer may be epitaxiallygrown on the substrate and doped in-situ (or after formation of theepitaxial layer). It should be noted that the substrate and the emitterlayer (first emitter) have opposite doping conductivity.

In block 306, a patterned layer is formed on the doped emitter layer orportion of the photovoltaic device. The patterned layer includesopenings that expose areas of the doped emitter layer. The patternedlayer may include one or more of a passivation layer and ananti-reflection coating on the doped emitter portion.

In block 308, portions of the doped emitter layer may be further doped(e.g., ion or dopant implantation) to form highly doped diffusionregions having a dopant concentration greater than other portions of thedoped emitter portion. The highly doped diffusion regions correspond tolocations of the openings in the patterned layer. In block 310, thehighly doped diffusion regions extend to a depth that is shallower thana thickness of the doped emitter layer. This depth may be 5%-70% of adepth of the emitter layer, more preferably between 40% and 60% (no longdrive-in). The highly doped diffusion regions have a same dopantconductivity as the emitter layer and an increased dopant concentration.

In block 312, an epitaxial layer is grown over the patterned layer suchthat a crystalline phase grows in contact with the doped emitter layerand a non-crystalline phase grows in contact with the patterned layer.The doped emitter layer forms a first emitter, and the epitaxial layerforms a second emitter. The first and second emitters include a samedopant conductivity. In one embodiment, the highly doped diffusionregions may also be formed by annealing the epitaxial layer, which isformed in contact with the doped emitter layer in the openings of thepatterned layer. Dopants may diffuse into the doped emitter layer fromthe epitaxial layer.

In block 314, the epitaxial layer is deposited using a plasma enhancedchemical vapor deposition process (PECVD) at a temperature less than 400degrees C. In a particularly useful embodiment, the epitaxial layer isdeposited at a temperature between 150 and 250 degrees C. with a gasratio of [H₂]/[SiH₄]>5 for silicon growth or a gas flow ratio of[H₂]/([SiH₄]+[GeH₄])>5 for SiGe growth. Other processes may include hotwire CVD (HWCVD) or the like.

In block 316, the non-crystalline phase is removed from the patternedlayer. In block 318, removing the non-crystalline phase from thepatterned layer may include employing a selective etch (e.g., a wet etchor a dry H plasma etch, etc.) to selectively remove the non-crystallinephase. In block 320, removing the non-crystalline phase from thepatterned layer may include employing the conductive contacts (to beformed) as a hard mask to etch the non-crystalline phase.

In block 322, a passivation layer (e.g., surface passivation layer) maybe formed on the epitaxial layer, which is disposed between theepitaxial layer and conductive contacts to be formed.

In block 324, conductive contacts are formed on the epitaxial layer inthe openings to form a contact area of the photovoltaic device. Theconductive contacts may include metal fingers corresponding to positionsof the openings.

In block 326, processing continues to complete the photovoltaic device.It should be understood that additional process steps, layers, andcomponents may be included with or instead of those described herein.The contact area formed may include a front contact area (e.g.,monofacial device), but may also include a back contact area (e.g., forbifacial devices) in addition to or instead of the front contact area.

Having described preferred embodiments for a selective emitterphotovoltaic device (which are intended to be illustrative and notlimiting), it is noted that modifications and variations can be made bypersons skilled in the art in light of the above teachings. It istherefore to be understood that changes may be made in the particularembodiments disclosed which are within the scope of the invention asoutlined by the appended claims. Having thus described aspects of theinvention, with the details and particularity required by the patentlaws, what is claimed and desired protected by Letters Patent is setforth in the appended claims.

1. A photovoltaic device, comprising: a contact area including: a dopedemitter layer having a first conductivity on a substrate having a secondconductivity; a patterned layer formed on the doped emitter layer, thepatterned layer including openings that expose areas of the dopedemitter layer; an epitaxial layer having a crystalline phase grown incontact with an upper surface of the doped emitter portion, theepitaxial layer having a same conductivity type as the doped emitterlayer with a greater doping concentration than the doped emitter layer;a diffusion region having a first conductivity extending from theepitaxial layer into the doped emitter layer, wherein a dopantconcentration that provides the first conductivity in the diffusionregion having a greater dopant concentration than other portions of thedoped emitter layer; and conductive contacts formed on the epitaxiallayer in the openings.
 2. The device as recited in claim 1, wherein thedoped emitter layer is formed in or on a monocrystalline substrate. 3.(canceled)
 4. (canceled)
 5. The device as recited in claim 1, whereinthe highly doped diffusion regions extend to a depth that is shallowerthan a thickness of the doped emitter portion.
 6. The device as recitedin claim 1, wherein the patterned layer includes one or more of apassivation layer and an anti-reflection coating.
 7. The device asrecited in claim 1, further comprising a passivation layer between theepitaxial layer and the conductive contacts.
 8. The device as recited inclaim 1, wherein the conductive contacts includes include metal fingerscorresponding to positions of the openings.
 9. The device as recited inclaim 1, wherein the epitaxial layer includes single crystalline or polycrystalline material formed using a plasma enhanced chemical vapordeposition process at a temperature less than 400 degrees C.
 10. Aphotovoltaic device, comprising: a first emitter formed on amonocrystalline substrate; a patterned layer formed on the firstemitter, the patterned layer including openings that expose areas of thefirst emitter; an epitaxial layer formed in the openings of thepatterned layer such that a crystalline phase grows in contact with thefirst emitter and forms a second emitter; at least one passivation layeron the epitaxial layer having a composition selected from the groupconsisting of amorphous hydrogenated silicon, nanocrystallinehydrogenated silicon, microcrystalline hydrogenated silicon and acombination thereof; and metal fingers formed on the epitaxial layer inthe openings to form a contact area.
 11. The device as recited in claim10, wherein the first and second emitters include a same dopantconductivity.
 12. The device as recited in claim 10, further comprisinghighly doped diffusion regions formed in the first emitter and having adopant concentration greater than other portions of the first emitter,the highly doped diffusion regions corresponding with locations of theopenings in the patterned layer.
 13. The device as recited in claim 12,wherein the highly doped diffusion regions extend to a depth that isshallower than a thickness of the first emitter.
 14. The device asrecited in claim 10, wherein the patterned layer includes one or more ofa passivation layer and an anti-reflection coating.
 15. (canceled) 16.The device as recited in claim 10, wherein the metal fingers correspondwith positions of the openings.
 17. The device as recited in claim 10,wherein the epitaxial layer includes single crystalline or polycrystalline material formed using a plasma enhanced chemical vapordeposition process at a temperature less than 400 degrees C.
 18. Aphotovoltaic device, comprising: a first emitter formed on amonocrystalline substrate; a patterned layer formed on the firstemitter, the patterned layer including openings that expose areas of thefirst emitter, the patterned layer including one or more of apassivation layer and an anti-reflection coating; highly doped diffusionregions formed in the first emitter and having a dopant concentrationgreater than other portions of the first emitter, the highly dopeddiffusion regions corresponding with locations of the openings in thepatterned layer; an epitaxial layer formed in the openings of thepatterned layer such that a crystalline phase is in contact with anupper surface of the first emitter and forms a second emitter; and metalfingers formed on the epitaxial layer in the openings to form a contactarea.
 19. The device as recited in claim 18, wherein the highly dopeddiffusion regions extend to a depth that is shallower than a thicknessof the first emitter.
 20. The device as recited in claim 18, furthercomprising a passivation layer between the epitaxial layer and the metalfingers.
 21. The device of claim 1, wherein the diffusion region has adepth as great as 0.5 microns, as measured from an interface between thedoped emitter layer and the epitaxial layer.
 22. The device of claim 10,wherein the at least one passivation layer has a thickness ranging from1 nm to 15 nm.
 23. The device of claim 18, wherein the highly dopeddiffusion regions have a depth of as great as 0.5 microns, as measuredfrom an interface between the first emitter and the second emitter.